Mattson is authorized to produce new machines from the original factory

Wide temperature range (100 ° C to 250 ° C)

Double crystal wafer processing controlled by microcontroller, with good process uniformity

Vacuum load lock isolation process room to reduce defects

High speed robot for simultaneous processing of polycrystalline wafers - High throughput (> 130 wph)

Small footprint with the highest throughput/square footprint in strip products smaller than 200mm

Compared to microwave source strip products, the cost of consumables is lower

VTM transmission to better ensure device particle requirements

Single cavity or dual cavity process selection, single cavity can process two pieces simultaneously

Supports 4 to 8-inch wafers

Strip rate: ≫ 5.6um/min

Uniformity within wafer (descum):< 5%

Uniformity within wafer (strip):< 5%

Uniformity wafer to wafer (strip): ≪ 5%

Uniformity run to run (strip): ≪ 5%

Uptime: ≫ 90%

1 minute process time (WPH):; one hundred and sixty

Particle (0.3um):& Lt; 50ea