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Own new equipment
International brands Equipment refurbishment
Semiconductor Materials
Process Line
CMP
Wafer Thinning machines
Grinding and Polishing integrated machines
Wafer Dicing machine
Electroplating equipment
WET - Fully automatic chemical nickel and palladium equipment
WET - Fully automatic cleaning equipment
Single Wafer Cleaner
WET - Fully automatic wet glue removal equipment
CLEAN TRACK
ASHER
Liquid supply system
Chiller/Heat Exchanger
LOCAL SCRUBBER
THIN FILM
DRY ETCH
LITHOGRAPHY
TRACK
IMPLANT
CMP
STRIPPER
FURNACE
WET
RTP
METROLOGY
ECD
OTHER
CMP Pad
CMP Disk
CMP Brush
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Own new equipment
International brands Equipment refurbishment
Semiconductor Materials
Process line
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International brands Equipment refurbishment
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THIN FILM
DRY ETCH
LITHOGRAPHY
TRACK
IMPLANT
CMP
STRIPPER
FURNACE
WET
RTP
METROLOGY
ECD
OTHER
THIN FILM
DRY ETCH
LITHOGRAPHY
TRACK
IMPLANT
CMP
STRIPPER
FURNACE
WET
RTP
METROLOGY
ECD
OTHER
METROLOGY-6/8inch
NANO 8000/8300/9300
KLA 5500/7600/7700
KLA P11
consult
METROLOGY-12inch
NANO
ATLAS/XP
consult
International brands Equipment refurbishment
GMCs Brand
Semiconductor Materials
Process Line
