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Own new equipment
International brands Equipment refurbishment
Semiconductor Materials
Process Line
CMP
Wafer Thinning machines
Grinding and Polishing integrated machines
Wafer Dicing machine
Electroplating equipment
WET - Fully automatic chemical nickel and palladium equipment
WET - Fully automatic cleaning equipment
Single Wafer Cleaner
WET - Fully automatic wet glue removal equipment
CLEAN TRACK
ASHER
Liquid supply system
Chiller/Heat Exchanger
LOCAL SCRUBBER
THIN FILM
DRY ETCH
LITHOGRAPHY
TRACK
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CMP
STRIPPER
FURNACE
WET
RTP
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CMP Pad
CMP Disk
CMP Brush
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Own new equipment
International brands Equipment refurbishment
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Process line
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International brands Equipment refurbishment
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THIN FILM
DRY ETCH
LITHOGRAPHY
TRACK
IMPLANT
CMP
STRIPPER
FURNACE
WET
RTP
METROLOGY
ECD
OTHER
THIN FILM
DRY ETCH
LITHOGRAPHY
TRACK
IMPLANT
CMP
STRIPPER
FURNACE
WET
RTP
METROLOGY
ECD
OTHER
CMP-6/8inch
CMP
AMAT MIRRA
I PEC472
consult
CMP-12inch
AMAT
REFLEXION
REFLEXION LK
EBARA
F-REX 300S/S2
consult
International brands Equipment refurbishment
GMCs Brand
Semiconductor Materials
Process Line
