GMC Semi-tech Co., Ltd.
WET - Fully automatic RCA cleaning equipment Chemical nickel palladium equipment Grinding and Polishing integrated machines Electroplating equipment Single Wafer Cleaner Wafer Thinning machines WET - Fully automatic wet glue removal equipment ASHER CLEAN TRACK Liquid supply system LOCAL SCRUBBER Heat Exchanger Wafer Dicing machine
WET(GMC-ECP510)
  • WET(GMC-ECP510)BackList
    Application field:
    TSV, TGV, Pilar, RDL, Bump and other processes

    Product size:
    Wafer 2 inch -12 inch/High density substrate 2 inch -20 inch

    Device configuration:

    Fully support the SECS/GEM communication protocol;

    Electroplating: Cu, Ni, Sn/Ag, Au;

    It can support single and double-sided electroplating, as well as simultaneous electroplating of multiple pieces;

    Support modular maintenance to improve equipment uptime;

    Temperature, flow rate, concentration, pressure, controllable and adjustable;

    Can customize R&D customized machines for various research institutions;

    Optional multiple loadports, equipped according to production capacity;

    Can provide overall solutions for equipment, medicine, and process;

    Equipment automation operation, dry in and dry out


    Process indicators:

    Electroplating uniformity:
    WiW ≤ 8% ;
    WtW ≤ 8%
     
International brands Equipment refurbishment GMCs Brand Semiconductor Materials Process Line