GMC Semi-tech Co., Ltd.
Wafer Thinning machines Grinding and Polishing integrated machines Wafer Dicing machine Electroplating equipment Chemical nickel palladium equipment WET - Fully automatic RCA cleaning equipment Single Wafer Cleaner WET - Fully automatic wet glue removal equipment CLEAN TRACK ASHER CVD/Etching/PVD Liquid supply system Chiller/Heat Exchanger LOCAL SCRUBBER
GMC-12SC
  • GMC-12SCBackList
    Equipment features:

    Stacking design can accommodate up to 12 chambers

    The upper and lower transport systems provide a throughput of up to 350wph

    Can be configured for front and back cleaning, with up to 5 types of medicinal liquids, and 2 types of medicinal liquids can be recycled

    The chamber can be equipped with a two fluid atomization nozzle

    The chamber can minimize chemical splashes and ensure a clean wafer processing environment

    The dynamic balance and uniformity of the ultra clean air in the chamber are good

     
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